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郝常山

作品数:3 被引量:2H指数:1
供职机构:中国科学技术大学更多>>
发文基金:国家自然科学基金安徽省自然科学基金更多>>
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Comparative Studies on Degradation of Methyl Orange by Nanostructured Zinc and Zinc Oxide Films
2010年
Nanostructured zinc and zinc oxide films were prepared by magnetron sputtering processes and succeeded air annealing treatments. Comparison of reductive degradation rate of methyl orange (MO) by zinc films and photocatalytic degradation rate of MO by zinc oxide films was carried out. Both reductive degradation and photocatalytic degradation process of MO by zinc and zinc oxide films can be described by first order kinetic model. It was found that although MO liquid was most quickly decolorized by metallic zinc films, the mineraliza- tion of MO was not thorough. Observation of extra ultraviolet absorption peaks indicated the formation of aromatic intermediates. On the other hand, although the photocatalytic degradation rate of MO liquid by ZnO films was only as about 1/4 large as the reductive degradation rate by zinc films, no signs of aromatic intermediates were found. Moreover, it was found that partially oxidized zinc oxide film showed higher photocatalytic efficiency than the totally oxidized ZnO films. Synergy effect between zinc and zinc oxide phase in the partially oxidized films was considered to be responsible for the higher photocatalytic efficiency.
吴炳俊郝常山谢斌李明
关键词:ZINCZNOPHOTOCATALYSIS
磁控溅射ZnO:Al(H)薄膜中的缺陷对电学性能和光学性能的影响机制研究
透明导电氧化物(TCOs)薄膜是把光学透明性能(可见光)和电学高导电性能复合在一体的光电材料。在电学性能方面,透明导电薄膜具有高的载流子浓度(一般在1020cm-3量级);在光学性能方面,它会反射红外光,吸收紫外光,又使...
郝常山
关键词:透明导电薄膜磁控溅射电学性能本征缺陷
工艺参数对磁控溅射制备ZnO:Al薄膜性能的影响及分析被引量:2
2010年
采用Al2O3质量分数为2.7%的ZnO:Al(简称AZO)陶瓷靶在RAS-1100C大型中频孪生靶磁控溅射镀膜设备上溅射制备了电阻率在10-3Ω·cm量级、可见光透过率>85%的AZO透明导电薄膜.分析了烘烤温度、氩气流速和溅射功率对薄膜电学性能的影响,同时还对固定在靶材前方不同区域处的衬底上沉积得到的AZO薄膜的电阻率差异进行了研究.实验发现靶材刻蚀沟道正前方处沉积的AZO薄膜的电阻率在10-2Ω·cm量级,而两块靶材中间非溅射区域正前方处所沉积的AZO薄膜的电阻率则在5×10-4Ω·cm左右.此研究结果表明沉积在RAS夹具圆筒上的AZO薄膜的性能是靶前各区域溅射沉积薄膜的性能的混合平均.进一步提高RAS溅射制备的AZO薄膜的性能的关键在于抑制高能氧负离子的轰击注入效应以及提高薄膜的结晶性能.
吴炳俊郝常山李明谢斌
关键词:AZO薄膜磁控溅射
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