采用溶胶-凝胶浸渍提拉法在石英玻璃片上制备了Ag/TiO2薄膜。为研究不同热处理温度(500,600,700℃)对制备过程的影响,在薄膜的制备过程中其他的条件均不变(钛酸丁酯和硝酸银的摩尔比为1:0.18)。用透射电子显微镜(Transmission Electron Microscope,TEM)记录样品的透射显微镜图像和衍射花样以表征薄膜的结构,用背散射电子(Backscattered Electron,BSE)检测器观察样品表面的组分分布,用能谱EDAX(Energy Dispersive Analysis of X-rays)分析Ag/TiO2薄膜样品的元素成分组成。实验结果表明,500℃热处理时得到了含有尺寸均匀的纳米银粒子的Ag/TiO2膜,随着热处理温度的升高,Ag的颗粒逐渐长大,尺寸分布变得不均匀,同时,膜中的银逐渐向薄膜表面迁移并挥发。
The paper reports our novel work on chemical vapor deposition coating of titanium nitride (TiN) thin film on glass for energy saving. TiN films were deposited on glass substrates by atmospheric pressure chemical vapor deposition (APCVD) using titanium tetrachloride (TiCl4) and ammonia (NH3) as precur-sors. As a result, TiN films with a thickness of 500 nm were obtained. X-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM), four-point probe method and optical spectroscopy were respectively employed to study the crystallization, microstructure, surface mor-phology, electrical and optical properties of the coated TiN films. The deposited TiN films are of NaCl structure with a preferred (200) orientation. The particles in the film are uniform. The reflectivity of the TiN coating in the near-infrared (NIR) band can reach over 40%, the visible transmittance is approxi-mately 60%, and the visible reflectivity is lower than 10%. The sheet electrical resistance is 34.5Ω. According to Drude theory, the lower sheet resistance of 34.5 Ω gives a high reflectivity of 71.5% around middle-far infrared band. The coated films exhibit good energy-saving performance.
ZHENG PengFei ZHAO GaoLing ZHANG TianBo WU LiQing WANG JianXun HAN GaoRong
