A device was designed and assembled to analyze the outgassing of molecular glass(MG)photoresists under extreme ultraviolet(EUV)exposure.The outgassing of the photoresists with different components and different concentrations of tert-butoxycarbonyl(t-Boc),photo-generated acid(PAG),and acid quencher was systematically investigated.Based on experiments,some solutions for reducing the outgassing of MG photoresists were proposed.
CHEN LiXU JianYUAN HuaYANG Shu MinWANG Lian ShengWU Yan QingZHAO JunCHEN MingLIU Hai GangLI Sha YuTAI Ren ZhongWANG Shuang QingYANG Guo Qiang
