您的位置: 专家智库 > >

国家自然科学基金(s10625209)

作品数:2 被引量:3H指数:1
发文基金:国家自然科学基金国家重点基础研究发展计划更多>>
相关领域:电子电信轻工技术与工程更多>>

文献类型

  • 2篇期刊文章
  • 1篇会议论文

领域

  • 2篇电子电信
  • 1篇轻工技术与工...
  • 1篇理学

主题

  • 1篇有限元
  • 1篇有限元方法
  • 1篇元方法
  • 1篇屈曲
  • 1篇热压
  • 1篇微尺度
  • 1篇纳米
  • 1篇光刻
  • 1篇光刻工艺
  • 1篇EXPERI...
  • 1篇FABRIC...
  • 1篇HOLOGR...
  • 1篇PHASE-...
  • 1篇MICROS...
  • 1篇SHIFTI...
  • 1篇GRATIN...
  • 1篇ABERRA...
  • 1篇COMPEN...

机构

  • 1篇清华大学

作者

  • 1篇胡振兴
  • 1篇谢惠民
  • 1篇王庆华
  • 1篇李艳杰

传媒

  • 1篇Acta M...
  • 1篇Scienc...

年份

  • 1篇2011
  • 2篇2009
2 条 记 录,以下是 1-3
排序方式:
微尺度力学检测技术研究
随着微纳米技术的发展,涌现出很多微器件如MEMS、NEMS等。这些微器件的可靠性和器件的力学性能直接相关,迫切需要开展力学性能测量的研究,其中最重要的是相应尺度的变形测量和结构检测技术。尺寸的缩小对力学测量技术提出很多挑...
谢惠民李艳杰王庆华胡振兴
关键词:屈曲
文献传递
A novel random phase-shifting digital holographic microscopy method被引量:3
2009年
This paper proposes a new method that reconstructs the information of specimen by using random phase shift step in digital holographic microscopy (DHM). The principles of the method are described and discussed in detail. In practical experiment, because the phase shifter is neither perfectly linear nor calibrated, digital holograms with inaccurate phase shift step are recorded by the charge-coupled device (CCD). The phase could be accurately reconstructed from the recorded digital holograms by using the random phase-shifting algorithm, which makes up for reconstructed phase error caused by ordinary phase-shifting algorithm. The phase aberration compensation is also discussed. In order to verify the flexibility of the proposed method, numerical simulation of random phase-shifting DHM was carried out. The simulation results illustrated that the presented method is effective when the phase shift step is unknown or random in DHM.
HuiMin Xie ZhenXing Hu FuLong Dai YanJie Li PengWan Chen QingMing ZhangFengLei Huang
关键词:HOLOGRAPHICMICROSCOPYPHASE-SHIFTINGABERRATIONCOMPENSATION
OPTIMUM DESIGN OF PROCESSING CONDITION AND EXPERIMENTAL INVESTIGATION OF GRATING FABRICATION WITH HOT EMBOSSING LITHOGRAPHY
2009年
The cross-section profiles of polymer deformation in the hot embossing lithography process were studied by finite element method for various temperature,time and pressure.In order to successfully fabricate high-frequency grating lines,an optimal imprint condition was selected and the related experiments were carried out.The fabricated gratings were illuminated by the SEM image and AFM analysis,which agree well with the simulated results.Therefore,the finite element methods are helpful for a better comprehension of the polymer flow phenomena governing the pattern definition and the design of optimum processing conditions for successful grating fabrication.
Jianguo ZhuHuimin XieMinjin TangXiaojtm Li
关键词:光刻工艺有限元方法热压
共1页<1>
聚类工具0