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国家自然科学基金(21271188)

作品数:8 被引量:14H指数:3
相关作者:余志明魏秋平刘丹瑛龙芬张雄伟更多>>
相关机构:中南大学中国工程物理研究院南京三乐电子信息产业集团有限公司更多>>
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8 条 记 录,以下是 1-8
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微波CVD方法在Ar-CO_2-CH_4体系中沉积超纳米金刚石薄膜(英文)被引量:1
2015年
采用微波CVD系统研究了Ar-CO_2-CH_4气氛中不同工艺条件对超纳米金刚石薄膜形貌的影响。结果表明:以Ar-CO_2-CH_4为反应气源,可制备出晶粒尺寸为20 nm左右、表面粗糙度在16 nm以下,厚度达5μm以上,结构致密的超纳米金刚石薄膜;在Ar-CH_4组分中添加CO_2可明显提高金刚石膜的沉积速率,但采用该气源组分能够得到致密金刚石膜的气源组成范围很窄。其原因和控制方式有待深入研究。
丰杰祁尧盛景恺李周马莉吴先哲胡东平梅军余志明魏秋平
关键词:原子力显微镜沉积速率
Growth mechanism of icosahedral and other five-fold symmetric diamond crystals被引量:3
2015年
Five-fold symmetric diamond crystals(FSDCs) were synthesized by hot filament chemical vapour deposition(HFCVD) methods. Their surface morphologies and defects were characterised by scanning electron microscopy(SEM). From the perspective of nucleation-growth, a growth mechanism for icosahedral and other five-fold symmetric diamond crystals was discussed. Computer modelling was also carried out. The results show that the dodecahedrane(C20H20) molecule is proposed as a nucleus for the growth of icosahedral diamond crystals(IDCs), wherein the 20 {111} surface planes develop orthogonal to the direction of the original 20 C—H bonds by sequential H abstraction and CH3 addition reactions. IDC can be pictured as an assembly of isosceles tetrahedra, with each tetrahedron contributing a {111} plane to the surface of the IDC and the remainder of the tetrahedral surfaces forming twin planes with neighbouring tetrahedra. The small mismatch(1.44°) between the {111} surface dihedral angle of a perfect icosahedron and that of a twinned icosahedron reveals itself via twin planes in the IDC grain. The modelling suggests how the relief of strain induced by this distortion could lead to the formation of defects such as concave pentagonal cavities at vertices and grooves along the grain edges that accord well with those observed experimentally. Similar arguments based on growth from the hexacyclo pentadecane(C15H20) nucleus can also account for the observed formation of star and rod shaped FSDCs, and some of their more obvious morphological defects.
魏秋平马莉叶浚余志明
关键词:ICOSAHEDRON
Microscopic mechanical characteristics analysis of ultranano-crystalline diamond films
2015年
The microscopic mechanical characteristics of ultranano-crystalline diamond films which were prepared in four different atmospheres were investigated for the applications in microelectron-mechanical system(MEMS).The loading-unloading curves and the change of modulus and hardness of samples along with depth were achieved through nanoindenter.The results show that the films which are made in atmosphere without Ar have the highest recovery of elasticity,hardness(72.9 GPa) and elastic modulus(693.7 GPa) among the samples.Meanwhile,samples fabricated at a low Ar content have higher hardness and modulus.All the results above demonstrate that atmosphere without Ar or low Ar content leads to better mechanical properties of nanodiamond films that are the candidates for applications in MEMS.
丰杰谢友能李周吴先哲李建国梅军余志明魏秋平
关键词:NANOINDENTATION
氮气含量对射频磁控溅射法制备的AlN薄膜微观结构与力学性能的影响被引量:3
2014年
用Ar气和N2气分别作为溅射气体和反应气体,采用射频反应磁控溅射法,通过调节工作气体(Ar气与N2气的混合气体)中N2的含量(体积分数)φ(N2),在硅(100)衬底上制备一系列六方结构AlN多晶薄膜,利用X射线衍射(XRD)、扫描电镜(SEM)、原子力显微镜(AFM)和纳米压痕仪等对薄膜特性进行测试与分析。结果表明,φ(N2)对AlN薄膜的择优取向、结晶性、沉积速率与力学性能的影响都十分显著,对薄膜的微观结构和表面粗糙度也有一定影响:随φ(N2)增大,薄膜的厚度和沉积速率逐渐减小,结晶性也发生显著变化;较高的φ(N2)有利于AlN薄膜沿(002)晶面择优生长;φ(N2)对AlN薄膜的硬度影响较大,而对弹性模量影响较小。实验制备的AlN薄膜具有良好的纳米力学性能,硬度平均值在12.0~29.3 GPa之间,弹性模量平均值在184.0~209.8 GPa之间。
余志明刘丹瑛魏秋平张雄伟龙芬罗嘉祺王一佳
关键词:氮化铝薄膜反应溅射纳米压痕
Preparation, characterization and electrochemical properties of boron-doped diamond films on Nb substrates
2013年
A series of boron-doped polycrystalline diamond films were prepared by hot filament (HF) chemical vapor deposition on Nb substrates. The effects of B/C ratio of reaction gas on film morphology, growth rate, chemical bonding states, phase composition and electrochemical properties of each deposited sample were studied by scanning electron microscopy, Raman spectra, X-ray diffraction, microhardness indentation, and electrochemical analysis. Results show that the average grain size of diamond and the growth rate decrease with increasing the B/C ratio. The diamond films exhibit excellent adhesion under Vickers microhardness testing (9.8 N load). The sample with 2% B/C ratio has a wider potential window and a lower background current as well as a faster redox reaction rate in H2SO4 solution and KFe(CN)6 redox system compared with other doping level electrodes.
余志明王健魏秋平孟令聪郝诗梦龙芬
基体梯度降温对钛合金表面沉积金刚石薄膜的影响被引量:3
2012年
采用热丝化学气相沉积法(HFCVD)在钛合金(Ti6A14V)表面沉积金刚石薄膜,研究基体温度对金刚石形核的影响,及梯度降温CVD技术(即高温梯度降温形核-低温生长)对所得金刚石薄膜样品的物相组成、表面形貌和附着性能的影响。利用扫描电镜(SEM)、激光拉曼光谱(Raman)和维氏硬度仪分析薄膜的形貌、结构、成分和附着性能。结果表明:基体温度较高时,基体表面钛原子和活性碳原子具有更高的能量,更利于活性碳原子向基体的扩散,促进碳化钛的形成,最终延长金刚石的孵化期;采用高温形核-1氐温生长的梯度降温法可以在550-600℃下沉积质量良好的金刚石薄膜;基体温度在30min内从800℃逐渐降温至550℃后再生长7h,所得金刚石薄膜样品具有较好的附着性能。
余志明张益豪魏秋平龙芬阳泰明刘丹瑛
关键词:热丝化学气相沉积金刚石薄膜TI6AL4V形核
Preparation of diamond/Cu microchannel heat sink by chemical vapor deposition被引量:2
2015年
A Ti interlayer with thickness about 300 nm was sputtered on Cu microchannels, followed by an ultrasonic seeding with nanodiamond powders. Adherent diamond film with crystalline grains close to thermal equilibrium shape was tightly deposited by hot-filament chemical vapor deposition(HF-CVD). The nucleation and growth of diamond were investigated with micro-Raman spectroscope and field emission scanning electron microscope(FE-SEM) with energy dispersive X-ray detector(EDX). Results show that the nucleation density is found to be up to 1010 cm-2. The enhancement of the nucleation kinetics can be attributed to the nanometer rough Ti interlayer surface. An improved absorption of nanodiamond particles is found, which act as starting points for the diamond nucleation during HF-CVD process. Furthermore, finite element simulation was conducted to understand the thermal management properties of prepared diamond/Cu microchannel heat sink.
刘学璋罗浩苏栩余志明
Effects of sputtering pressure on nanostructure and nanomechanical properties of AlN films prepared by RF reactive sputtering被引量:2
2014年
Wurtzite aluminum nitride(AlN) films were deposited on Si(100) wafers under various sputtering pressures by radio-frequency(RF) reactive magnetron sputtering. The film properties were investigated by XRD, SEM, AFM, XPS and nanoindenter techniques. It is suggested from the XRD patterns that highly c-axis oriented films grow preferentially at low pressures and the growth of(100) planes are preferred at higher pressures. The SEM and AFM images both reveal that the deposition rate and the surface roughness decrease while the average grain size increases with increasing the sputtering pressure. XPS results show that lowering the sputtering pressure is a useful way to minimize the incorporation of oxygen atoms into the AlN films and hence a film with closer stoichiometric composition is obtained. From the measurement of nanomechanical properties of AlN thin films, the largest hardness and elastic modulus are obtained at 0.30 Pa.
魏秋平张雄伟刘丹瑛李劼周科朝张斗余志明
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